Ultra Pure Water (UPW) is the lifeblood of semiconductor manufacturing, but how is it made? The production of UPW requires advanced purification technologies that remove contaminants down to parts per trillion (ppt) levels.
Step-by-Step UPW Production Process
1. Pre-Treatment: Removing Large Particles
- Sand & multimedia filters eliminate suspended solids.
- Activated carbon filtration removes organic compounds and chlorine.
2. Reverse Osmosis (RO): Removing Dissolved Impurities
- RO membranes remove up to 99% of contaminants, including dissolved salts and bacteria.
3. Electrodeionization (EDI): Eliminating Ions
- This process replaces traditional ion exchange resins, producing continuous deionized water.
4. Ultrafiltration (UF): Removing Micro-Particles
- Filters out bacteria, viruses, and endotoxins to achieve semiconductor-grade purity.
5. UV Oxidation & Degasification: Breaking Down Contaminants
- UV oxidation destroys organic carbon compounds, preventing defects in chip manufacturing.
- Dissolved gas removal ensures no oxygen-related oxidation occurs on wafers.
Conclusion
By combining reverse osmosis, deionization, ultrafiltration, and real-time monitoring, semiconductor fabs ensure the highest level of purity in their UPW systems.
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